Robust level-set-based inverse lithography

Robust level-set-based inverse lithography.

Level-set based inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem, interpreted with a time-dependent model, and then solved as a partial differential equation with finite difference schemes. This paper focuses on developing level-set based ILT for partially coherent systems, and upon that an expectation-orient optimization frame...

Level-set-based inverse lithography for photomask synthesis.

Inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of ...

A Level Set Method for Inverse Problems

Parametric Level Set Methods for Inverse Problems

In this paper, a parametric level set method for reconstruction of obstacles in general inverse problems is considered. General evolution equations for the reconstruction of unknown obstacles are derived in terms of the underlying level set parameters. We show that using the appropriate form of parameterizing the level set function results a significantly lower dimensional problem, which bypass...

A pixel - based regularization approach to inverse lithography q

Inverse lithography attempts to synthesize the input mask which leads to the desired output wafer pattern by inverting the forward model from mask to wafer. In this article, we extend our earlier framework for image prewarping to solve the mask design problem for coherent, incoherent, and partially coherent imaging systems. We also discuss the synthesis of three variants of phase shift masks (P...